The carbon-based deoxidation nitrogen purification unit further purifies 99.9% nitrogen from generators. Residual oxygen reacts with carbon to form CO₂, which is then removed together with moisture, increasing nitrogen purity to over 99.999%. The system delivers ultra-high-purity nitrogen for demanding industrial applications.
1. Semiconductor wafer manufacturing：
Supplies ultra-high-purity nitrogen to prevent wafer oxidation and contamination.
2. Special alloy smelting：
Creates an inert atmosphere to prevent oxidation and decarburization of high-temperature alloys.
3. Powder metallurgy：
Isolates oxygen and prevents oxidation of metal powders and workpieces during high-temperature processing.
4. Optical fiber manufacturing：
Uses high-purity nitrogen as a shielding gas to protect fibers from oxidation and ensure stable optical performance.
Technical Indicators
| Nitrogen flow rate: 1 – 5000 Nm³/h |
(under standard conditions) |
| Nitrogen purity: 90% – 99.9995% |
(based on national standard, non-oxygen content) |
| Nitrogen pressure: 0.01 – 0.8 MPa |
(stable and adjustable gauge pressure) |
| Nitrogen dew point: -40°C to -70°C |
(atmospheric dew point) |
Part drawing
